发明名称 METHOD FOR GROWING FINE THREE-DIMENSIONAL STRUCTURE IN OBLIQUE, LOWER DIRECTION BY CVD AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a technique by which even hyperfine cubic structures having three-dimensional shape warped to the lower direction can be formed by a CVD (Chemical Vapor Deposition) process where focused ion beams are irradiated to sample faces while a gaseous starting material is sprayed thereon. SOLUTION: In the deposition technique, a focused ion beam apparatus in which gas spray density is made higher than that in the case of the conventional deposition is used. The method includes a step where, at first, a base part is formed; a step where, at the point of the time in which a projecting part as the base has been formed, a sample stage is made oblique; and a step where the base part is irradiated with a beam, and further, the irradiation region is moved to the upper direction of the stage oblique face. Further, as the driving mechanism of the stage, the one by axial driving performing movement, rotation, and obliqueness in the three-dimensional directions of x, y and z axes is used. A rotation mechanism is further provided on the oblique mechanism, so that the degree of freedom in the positional relation between the structure and the ion beam is increased.
申请公布号 JP2002317272(A) 申请公布日期 2002.10.31
申请号 JP20010118541 申请日期 2001.04.17
申请人 SEIKO INSTRUMENTS INC 发明人 MINAFUJI TAKASHI
分类号 C23C16/48;H01L21/205;(IPC1-7):C23C16/48 主分类号 C23C16/48
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