| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a photocatalytic thin film. SOLUTION: In the manufacturing method of depositing the photocatalytic thin film by depositing a titanium dioxide layer exhibiting photocatalytic property on a substrate by sputtering using a titanium(Ti) target, the partial pressure of oxygen in an atmospheric gas is controlled to 0.16-Pa to 1.2 Pa, the pressure of the whole atmospheric gas is controlled to 0.8 Pa to 3.0 Pa and the film thickness of the titanium dioxide layer is controlled to 120 nm to 200 nm. The photocatalytic thin film is manufactured by the manufacturing method.
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