发明名称 |
METHOD AND DEVICE FOR THE PRODUCTION OF PROCESS GASES |
摘要 |
The aim of the invention is the simple and economical production of a hydrogen-rich process gas from water vapour and hydrogen, whereby the proportion of water vapour to hydrogen may be precisely controllable and reproducible. Said aim is achieved, with a method and device for the production of a process gas for the treatment of substrates, in particular semiconductor substrates, in which the oxygen for formation of a process gas, comprising water vapour and hydrogen, is burnt in a hydrogen-rich environment in a combustion chamber. |
申请公布号 |
WO02086958(A1) |
申请公布日期 |
2002.10.31 |
申请号 |
WO2002EP04345 |
申请日期 |
2002.04.19 |
申请人 |
MATTSON THERMAL PRODUCTS GMBH;ROTERS, GEORG;MADER, ROLAND;SOMMER, HELMUT;ERLIKH, GENRIH;PASHUT, YEHUDA |
发明人 |
ROTERS, GEORG;MADER, ROLAND;SOMMER, HELMUT;ERLIKH, GENRIH;PASHUT, YEHUDA |
分类号 |
H01L21/31;F22B1/00;H01L21/316 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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