发明名称 METHOD OF PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 <p>The carrying of wafers in the bay of a clean room (a group of devices) is effected by a RGV (Rail Guided Vehicle) linearly moving at high speed on a carrier rail (3) laid on the floor of the clean room. The carrier area where the RGV travels is separated from a manual working area by a partition (4), so that no one can enter the carrier area during the operating time of the line.</p>
申请公布号 WO2002086963(P1) 申请公布日期 2002.10.31
申请号 JP2002003391 申请日期 2002.04.04
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