发明名称 Mischungen aus symmetrischen und asymmetrischen Nickel-Formazan Farbstoffen
摘要 A mixture of symmetrical and unsymmetrical nickel formazan dyes are of formula (I). In (I): W = group of formula (i); X = group of formula (ii); Y = group of formula (iii); and Z = group of formula (iv). The mixtures are selected from A to E where: (a) A is given by: (i) R = 2 ethoxy; R2 = 4-methyl; R3 = 4-methyl, 2-ethoxy; (ii) R = 2-ethoxy; R2 = 4-isopropyl; R3 = 4-isopropyl, 2-ethoxy; (iii) R = 2-ethoxy; R2 = 4-methyl, R3 = 4-isopropyl, 2-ethoxy. (b) B is given by: (i) R = 2-methyl, R2 = 3,4-dimethyl, R3 = 3,4-dimethyl, 2-ethoxy; (ii) R = 2-methyl, R2 = 3,4-dimethyl; R3 = 3,4-dimethyl, 2-methyl; (iii) R = 2-methyl, R2 = 3,4-dimethyl; R3 = 3,4-dimethyl, 2-ethoxy. (c) C is given by: (i) R = 2-ethoxy, R2 = 4-isopropyl; R3 = 4-isopropyl, 2-ethoxy; (ii) R = 2-ethoxy, R2 = 3,4-dimethyl; R3 = 3,4-dimethyl, 2-ethoxy; (iii) R = 2-ethoxy, R2 = 3,4-dimethyl; R3 = 4-isopropyl, 2-ethoxy. (d) D is given by: (i) R = 2-ethoxy; R2 - 4-methyl; R3 = 4-methyl, 2-ethoxy; (ii) R = 2-ethoxy; R2 = 4-secbutyl; R3 = 4-secbutyl, 2-ethoxy; (iii) R = 2-ethoxy; R2 = 4-methyl; R3 = 4-secbutyl, 2-ethoxy. (e) E is given by: (i) R = H, R2 = 4-SO2N(CH2CH2)2O; R3 = 4-SO2N(CH2CH2)2O, H; (ii) R = 3-methyl; R2 = 4SO2N(CH2CH2)2O; R3 - 4-SO2N(CH2CH2)2O, 3-methyl; and (iii) R = H, R2 = 4-SO2N(CH2CH2)2O; R3 = 4-SO2N(CH2CH2)2O, 3-methyl. Also claimed is an optical recording element having a transparent substrate and a light reflecting layer.
申请公布号 DE69710543(T2) 申请公布日期 2002.10.31
申请号 DE1997610543T 申请日期 1997.09.15
申请人 EASTMAN KODAK CO., ROCHESTER 发明人 CHAPMAN, DEREK DAVID;GOSWAMI, RAMANUJ
分类号 C09B50/00;C09B67/22;G11B7/246;(IPC1-7):C09B50/00;C09B67/00;G11B7/24 主分类号 C09B50/00
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