发明名称 |
WAFER TRANSFER APPARATUS, VAPOR PHASE GROWTH SYSTEM, AND METHOD OF TRANSFERRING WAFER |
摘要 |
PROBLEM TO BE SOLVED: To provide a wafer transfer apparatus that can accurately recognize the central position of a wafer, even if a sensor detects the outer periphery of the orientation flat or notch of the wafer, and to provide a vapor phase growth system and a method of transferring the wafer. SOLUTION: The wafer tranfer apparatus is provided with a detector 7 which detects four or more points on the outer periphery of the wafer W and an arithmetic section which finds four or more candidates for the center position of the wafer W through calculation based on the detected results of the detector 7. The device is also provided with a recognition section which recognizes the true central position of the wafer W, by discriminating the position out of the candidates found by means of an arithmetic section and a transfer mechanism 4 which transports the wafer W to a prescribed position based on the true center position of the wafer W recognized by means of the recognition section. |
申请公布号 |
JP2002319612(A) |
申请公布日期 |
2002.10.31 |
申请号 |
JP20010123049 |
申请日期 |
2001.04.20 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
KANETANI KOICHI |
分类号 |
B65G49/07;H01L21/205;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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