发明名称 WAFER TRANSFER APPARATUS, VAPOR PHASE GROWTH SYSTEM, AND METHOD OF TRANSFERRING WAFER
摘要 PROBLEM TO BE SOLVED: To provide a wafer transfer apparatus that can accurately recognize the central position of a wafer, even if a sensor detects the outer periphery of the orientation flat or notch of the wafer, and to provide a vapor phase growth system and a method of transferring the wafer. SOLUTION: The wafer tranfer apparatus is provided with a detector 7 which detects four or more points on the outer periphery of the wafer W and an arithmetic section which finds four or more candidates for the center position of the wafer W through calculation based on the detected results of the detector 7. The device is also provided with a recognition section which recognizes the true central position of the wafer W, by discriminating the position out of the candidates found by means of an arithmetic section and a transfer mechanism 4 which transports the wafer W to a prescribed position based on the true center position of the wafer W recognized by means of the recognition section.
申请公布号 JP2002319612(A) 申请公布日期 2002.10.31
申请号 JP20010123049 申请日期 2001.04.20
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 KANETANI KOICHI
分类号 B65G49/07;H01L21/205;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/07
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