发明名称 EDGE TRANSFER LITHOGRAPHY
摘要 A method for applying a nanoscale resolution pattern of a molecular ink onto a surface of a substrate is disclosed. The method referred to as edge transfer lithography, comprises providing a stamp structure (10) having a surface (11) with at least one protruding feature (16). Each protruding feature (16) has a stamp surface of a respective predefined shape at a protruding end thereof. Each protruding feature and its stamp surface are bounded by at least one edge (19), which edge intersects the surface of the stamp structure to form a recess. A solution of the molecular ink and a solvent is applied of the surface of the stamp structure (10) are such that the solution dewets from the surface of the stamp structure (10) is then dried to evaporate the solvent.
申请公布号 WO02085639(A1) 申请公布日期 2002.10.31
申请号 WO2002US13154 申请日期 2002.04.25
申请人 THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OFNEW YORK;ADAMS, DAVID;CHERNIAVSKAYA, OKSANA 发明人 ADAMS, DAVID;CHERNIAVSKAYA, OKSANA
分类号 B41C1/00;B41C3/04;B41M1/10;B81C1/00;C40B60/14;G03F7/00;(IPC1-7):B41N6/00 主分类号 B41C1/00
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