发明名称 Semiconductordevice having a ferroelectric capacitor and fabrication process thereof
摘要 <p>A semiconductor device has a ferroelectric capacitor including a ferroelectric film provided on a lower electrode and an upper electrode provided on the ferroelectric film, wherein the upper electrode is formed of a first layer of a non-stoichiometric oxide and a second layer of a non-stoichiometric or stoichiometric oxide provided on the first layer, the second oxide having a composition closer to the stoichiometric composition as compared with the first layer.</p>
申请公布号 EP1253627(A2) 申请公布日期 2002.10.30
申请号 EP20010122797 申请日期 2001.09.21
申请人 FUJITSU LIMITED 发明人 TAKAMATSU, TOMOHIRO;NAKAMURA, KO;MATSUURA, KATSUYOSHI
分类号 H01L21/8246;H01L27/105;H01L21/02;H01L21/314;(IPC1-7):H01L21/02 主分类号 H01L21/8246
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