| 摘要 |
PURPOSE: A semiconductor fabrication apparatus for removing fumes is provided to remove effectively fumes due to gases generated from processes in order not to generate particles by improving a rate of operation of the semiconductor fabrication apparatus. CONSTITUTION: A load lock chamber(10) includes a heater(11) which is located at a center of a system main frame in order to maintain setup temperature of a processed wafer in a wafer transfer process. The load lock chamber(10) is used for loading the wafers until the wafers are transferred or forming a vacuum state after the wafers are transferred. A buffer chamber(20) has a heater(21) for maintaining the setup temperature in the wafer transfer process. The buffer chamber(20) is used for transferring the wafers of the load lock chamber(10) to transferring the first to the third process chambers(30,40,50) or the processed wafers of the first to the third process chambers(30,40,50) to the load lock chamber(10). The first to the third process chambers(30,40,50) are used for performing processes for the wafers.
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