Composition for film formation, method of film formation, and silica-based film

摘要

A composition for film formation which comprises:(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of(A-1) compounds represented by the following formula (1)(A-2) compounds represented by the following formula (2)and(A-3) compounds represented by the following formula (3)(B) at least one member selected from the group consisting of compounds of the metals in Groups IA and IIA of the periodic table; and(C) an organic solvent. A method for film formation using the composition and a silica-based film obtained by the method are also disclosed.