发明名称 |
Compositions for use in a chemical-mechanical planarization process |
摘要 |
Provided are methods for making a slurry composition, suitable for use in a chemical-mechanical planarization process. Also provided are compositions made by such methods. The methods comprise combining: (a) abrasive particles; (b) a suspension medium; (c) a peroxygen compound; (d) an etching agent; and (e) an alkyl ammonium hydroxide. The methods and compositions of the present invention are particularly applicable to the semiconductor manufacturing industry.
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申请公布号 |
US6471735(B1) |
申请公布日期 |
2002.10.29 |
申请号 |
US20000634852 |
申请日期 |
2000.08.08 |
申请人 |
AIR LIQUIDE AMERICA CORPORATION |
发明人 |
MISRA ASHUTOSH;HOFFMAN JOE G.;SCHLEISMAN ANTHONY J. |
分类号 |
B24B37/00;C09G1/02;C09K3/14;C09K13/00;C09K13/08;H01L21/304;H01L21/306;H01L21/3105;(IPC1-7):C09K3/14;C09G1/04;B24B1/00 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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