发明名称 Copper chloride etchant regeneration plant - is automatically functioning and self contained
摘要 <p>Plant for the regeneration of Cu chloride etchant for Cu and its alloys comprises storage tanks for H2O2 and HCl, a reaction tank with the reagent into which dips a redox electrode for controlling the amount of H2O2 and HCl additions which may be required depending on the state of the etchant, circulation pump, valves and pipe connections and in - and outlets for the regenerated etchant. The plant is for printed circuit manufacture and ensures a continuous supply of full strength Cu-chloride etchant.</p>
申请公布号 FR2105361(A5) 申请公布日期 1972.04.28
申请号 FR19700031978 申请日期 1970.09.02
申请人 CHEMCUT CORP 发明人
分类号 C23F1/46;(IPC1-7):23G1/00;23F1/00 主分类号 C23F1/46
代理机构 代理人
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