摘要 |
<p>Plant for the regeneration of Cu chloride etchant for Cu and its alloys comprises storage tanks for H2O2 and HCl, a reaction tank with the reagent into which dips a redox electrode for controlling the amount of H2O2 and HCl additions which may be required depending on the state of the etchant, circulation pump, valves and pipe connections and in - and outlets for the regenerated etchant. The plant is for printed circuit manufacture and ensures a continuous supply of full strength Cu-chloride etchant.</p> |