发明名称 DISCHARGE PLASMA PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method in which stable discharge plasma processing is performed by generating uniform discharge plasma under the pressure in the vicinity of the atmospheric pressure regardless of a gas atmosphere in processing. SOLUTION: A solid dielectric 6 having relative dielectric constant of >=10 (under the environment of 25 deg.C) is provided on at least one counter surface of a pair of electrodes 4 and 5 opposed to each other, a base material 7 is disposed between one electrode 4 and the solid dielectric 6 or between the solid dielectrics, and the surface of the base material 7 is processed by the discharge plasma generated by applying the pulsed electric field having 1-40 kV/cm electric field intensity between the pair of electrodes.
申请公布号 JP2002316039(A) 申请公布日期 2002.10.29
申请号 JP20020001377 申请日期 2002.01.08
申请人 SEKISUI CHEM CO LTD 发明人 YUASA MOTOKAZU;YARA TAKUYA
分类号 H05H1/24;B01J19/08 主分类号 H05H1/24
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