| 发明名称 |
Preparation of photomasks |
| 摘要 |
The present invention relates to the preparation of an x-ray photomask by exposing a free-standing film of a radiation sensitive metal/chalcogenide to an electron beam scanned in a defined pattern so as to generate areas in the film of reduced metal content in accordance with the defined pattern, as well as novel x-ray photomasks. |
| 申请公布号 |
AU2002251281(A1) |
申请公布日期 |
2002.10.28 |
| 申请号 |
AU20020251281 |
申请日期 |
2002.04.11 |
| 申请人 |
THE UNIVERSITY COURT OF THE UNIVERSITY OF DUNDEE |
发明人 |
ALEXANDER GRANT FITZGERALD;KATRIN MIETZSCH |
| 分类号 |
G03F1/14;G03F1/22;G03F7/004;(IPC1-7):G03F1/14 |
主分类号 |
G03F1/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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