PHOTOMASK WASHING METHOD

摘要

PURPOSE: To certainly prevent the fogging of a photomask without using a large amount of a rinsing liquid in a method for washing the photomask wherein a shading film is provided on the surface of a glass substrate. CONSTITUTION: The photomask wherein the shading film is provided on the surface of the glass substrate is washed with O3 gas dissolved water to remove the organic matter bonded to the surface of the photomask (S120). Next, the photomask is washed with an alkaline chemical liquid such as alkali ion water or H2 dissolved water for the purpose of removing foreign matter (S122). After these washing processes are completed, the photomask is dried (S124).