| 摘要 |
PROBLEM TO BE SOLVED: To provide a device manufacturing apparatus which suppresses deterioration of the cleanness kept at a high level in a chamber due to production of out gases, etc. SOLUTION: A processor disposed in a chamber held at a high internal cleanness uses wiring members (13, 14, 17, 18, 30, 40, 60, 70) at least surface layers of which are made of a material with little out gases (fluoro-resin, polyimide, polyolefin, etc.). This suppresses the production quantity of chemical contaminant gases radiated from the wiring members as gases in degassing thereof and hence effectively suppresses the chemical contamination in the atmosphere of the processor. |
