发明名称 |
TRANSPARENT ELECTRODE, MANUFACTURING METHOD THEREOF AND GROUP III NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a p-type electrode superior in light transmission for group III nitride semiconductor light emitting elements and a group III nitride semiconductor light emitting element utilizing the same. SOLUTION: A thin film of gold simple substance is formed on a p-type group III nitride semiconductor surface and the surface of the gold thin film is protected with a silicon dioxide thin film to form a light-transmitting p-type electrode. The silicon dioxide thin protective film covering the gold thin film prevents gold from balling up even in an annealing process for obtaining an Ohmic junction, thereby obtaining a high light transmission. |
申请公布号 |
JP2002314131(A) |
申请公布日期 |
2002.10.25 |
申请号 |
JP20010111621 |
申请日期 |
2001.04.10 |
申请人 |
SHOWA DENKO KK |
发明人 |
MURAKI NORITAKA;MIKI HISAYUKI;OKUYAMA MINEO |
分类号 |
H01L21/28;H01L33/06;H01L33/12;H01L33/32;H01L33/42;H01L33/62 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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