发明名称 TRANSPARENT ELECTRODE, MANUFACTURING METHOD THEREOF AND GROUP III NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a p-type electrode superior in light transmission for group III nitride semiconductor light emitting elements and a group III nitride semiconductor light emitting element utilizing the same. SOLUTION: A thin film of gold simple substance is formed on a p-type group III nitride semiconductor surface and the surface of the gold thin film is protected with a silicon dioxide thin film to form a light-transmitting p-type electrode. The silicon dioxide thin protective film covering the gold thin film prevents gold from balling up even in an annealing process for obtaining an Ohmic junction, thereby obtaining a high light transmission.
申请公布号 JP2002314131(A) 申请公布日期 2002.10.25
申请号 JP20010111621 申请日期 2001.04.10
申请人 SHOWA DENKO KK 发明人 MURAKI NORITAKA;MIKI HISAYUKI;OKUYAMA MINEO
分类号 H01L21/28;H01L33/06;H01L33/12;H01L33/32;H01L33/42;H01L33/62 主分类号 H01L21/28
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