发明名称 SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a DRAM which is reduced in malfunction caused by noise by reducing the parasitic capacitance between groove-type stack cell capacitors in a memory cell area. SOLUTION: A groove type stack cell has a number of identical capacitors which are formed by burying storage nodes 8, capacitor insulating films 9, and plate electrodes 10 in a plurality of grooves provided on an interlayer insulating film 11. The cell is arranged so that the capacitors are faced only to one-side faces of the grooves.
申请公布号 JP2002313954(A) 申请公布日期 2002.10.25
申请号 JP20010379689 申请日期 2001.12.13
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SHIBATA YOSHIYUKI
分类号 H01L21/8242;H01L27/108 主分类号 H01L21/8242
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