发明名称 MAGNETRON SPUTTERING SYSTEM
摘要 <p>A DC magnetron sputter reactor capable of creating a self-ionized plasma and including a small unbalanced magnetron (50) rotating about the back of the target. The magnetron includes an outer pole (54, 60) of one magnetic polarity in a closed band shape surrounding an inner pole (52, 80) of the opposed magnetic polarity and of lesser total magnetic intensity. The inner pole, for example, including a tubular magnet has a central, magnet free passage (84) allowing magnetic field to pass therethrough from one side to the other of the inner pole. The outer band may be generally triangular with the base and apex composed of circular segments (66, 68) smoothly joined to straight sides (64). The pole face (68) of the inner pole may be cantilevered away from the inner pole towards the apex of the outer pole.</p>
申请公布号 WO2002084703(A1) 申请公布日期 2002.10.24
申请号 US2002007364 申请日期 2002.03.06
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