| 摘要 |
<p>A multi-layered film reflector manufacturing method achieving a desired precision of the shape of a reflection wavefront after partial removal of a multi-layered film. In the method, a part of the multi-layered film formed by depositing two or more kinds of substances of different diffractive indexes synchronously to form the layers with a predetermined period length on a substrate is removed from the surface of the substrate, and the phase of the reflection wavefront in a reflection face is corrected. The method is characterized in that the multi-layered film has an internal stress of 50 MPa or less.</p> |
