| 摘要 |
<p>An ultraviolet ray assisted processing device (10) for semiconductor processing, comprising a window (20) allowing the transmission of ultraviolet ray disposed in a wall for specifying a processing chamber (12) so as to oppose to a loading table (11), a light source (15) for emitting ultraviolet ray disposed on the outside of the processing chamber (12) so as to oppose to the window (20), and a processing gas feeding system for feeding processing gas into the processing chamber (12) having a head space (21) to pass the processing gas formed inside the window (20) and a plurality of discharge ports (22) for discharging the processing gas.</p> |
