发明名称 Ferroelectric memory and electronic apparatus
摘要 The present invention relates to a ferroelectric memory having a matrix-type memory cell array which has a superior degree of integration, in which the angularity of the ferroelectric layer's hysteresis curve is improved, the production yield is increased and costs are reduced. A ferroelectric memory having improved angularity in the hysteresis curve, and superior memory characteristics, production yield and costs is realized as follows. Namely, a peripheral circuit chip and a memory cell array chip are engaged onto an inexpensive assembly base 300 such as glass or plastic. In memory cell array chip 200, a ferroelectric layer is made to undergo epitaxial growth on to a Si single crystal via a buffer layer and first signal electrode. As a result, a ferroelectric memory can be realized which has improved angularity in the hysteresis curve and superior memory characteristics, production yield, and cost.
申请公布号 US2002155666(A1) 申请公布日期 2002.10.24
申请号 US20020105002 申请日期 2002.03.22
申请人 HIGUCHI TAKAMITSU;IWASHITA SETSUYA;MIYAZAWA HIROMU;HASEGAWA KAZUMASA;NATORI EIJI 发明人 HIGUCHI TAKAMITSU;IWASHITA SETSUYA;MIYAZAWA HIROMU;HASEGAWA KAZUMASA;NATORI EIJI
分类号 G11C11/22;H01L21/8246;H01L27/105;(IPC1-7):H01L29/76 主分类号 G11C11/22
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