| 发明名称 |
Semiconductor processing system and method |
| 摘要 |
Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.
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| 申请公布号 |
US2002153101(A1) |
申请公布日期 |
2002.10.24 |
| 申请号 |
US20010840349 |
申请日期 |
2001.04.21 |
| 申请人 |
NGUYEN TUE;NGUYEN TAI DUNG;BERCAW CRAIG ALAN |
发明人 |
NGUYEN TUE;NGUYEN TAI DUNG;BERCAW CRAIG ALAN |
| 分类号 |
C23C16/44;C23C16/455;C23C16/48;C23C16/515;H01L21/00;(IPC1-7):C23C14/00;C23F1/00;C23C16/00 |
主分类号 |
C23C16/44 |
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