发明名称 Homoepitaxial gallium nitride based photodetector and method of producing
摘要 A photodetector comprising a gallium nitride substrate, at least one active layer disposed on the substrate, and a conductive contact structure affixed to the active layer and, in some embodiments, the substrate. The invention includes photodetectors having metal-semiconductor-metal structures, P-i-N structures, and Schottky-barrier structures. The active layers may comprise Ga1-x-yAlxInyN1-z-wPzAsw, or, preferably, Ga1-xAlxN. The gallium nitride substrate comprises a single crystal gallium nitride wafer and has a dislocation density of less than about 105 cm-2. A method of making the photodetector is also disclosed.
申请公布号 US2002155634(A1) 申请公布日期 2002.10.24
申请号 US20010839941 申请日期 2001.04.20
申请人 GENERAL ELECTRIC COMPANY 发明人 D'EVELYN MARK PHILIP;EVERS NICOLE ANDREA;CHU KANIN
分类号 H01L31/0224;H01L31/0304;H01L31/108;(IPC1-7):H01L29/06;H01L31/032;H01L31/033 主分类号 H01L31/0224
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