发明名称 |
ULTRAVIOLET RAY ASSISTED PROCESSING DEVICE FOR SEMICONDUCTOR PROCESSING |
摘要 |
An ultraviolet ray assisted processing device (10) for semiconductor processing, comprising a window (20) allowing the transmission of ultraviolet ray disposed in a wall for specifying a processing chamber (12) so as to oppose to a loading table (11), a light source (15) for emitting ultraviolet ray disposed on the outside of the processing chamber (12) so as to oppose to the window (20), and a processing gas feeding system for feeding processing gas into the processing chamber (12) having a head space (21) to pass the processing gas formed inside the window (20) and a plurality of discharge ports (22) for discharging the processing gas.
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申请公布号 |
WO02084726(A1) |
申请公布日期 |
2002.10.24 |
申请号 |
WO2002JP02326 |
申请日期 |
2002.03.13 |
申请人 |
TOKYO ELECTRON LIMITED;SHAO, SHOU-QIAN;LI, YICHENG |
发明人 |
SHAO, SHOU-QIAN;LI, YICHENG |
分类号 |
C23C16/44;C23C16/455;C23C16/48;H01L21/00;H01L21/205;H01L21/26;H01L21/268;H01L21/316;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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