| 摘要 |
Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a hinged pellicle that is rotated away from the photomask during exposure. The pellicle can be transparent or opaque. In one embodiment, the photomask is supported by a photomask base, and the pellicle is hinged to one side of the photomask base. The pellicle can be moved away from the photomask by a robot arm. When covering the photomask base, the pellicle can be secured to it with a securing mechanism such as a vacuum arrangement. Methods of use are also described.
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