发明名称 VAPOR CONTROLLED CZOCHRALSKI(VCZ) SINGLE CRYSTAL GROWING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for growing a single crystal by a vapor pressure controlled Czochralski(VCZ) method, which has a heat wall sealing vessel which can be opened even when it is hot and which is used repeatedly. SOLUTION: The VCZ single crystal growing apparatus has a single crystal furnace, a heating unit, a mechanical transmission unit, a gas control unit, a heat wall sealing vessel 2 provided in the single crystal furnace, a crucible 6 placed in the heat wall sealing vessel 2, a crucible transmission shaft 7 and a seed shaft 8 each being inserted into the heat wall sealing vessel 2 through sealing devices 9, 10. Further, the heat wall sealing vessel 2 mentioned above has an upper vessel part 3 and a lower vessel part 4, and a connection device 5 for sealing is interposed between the upper vessel part 3 and the lower vessel part 4.
申请公布号 JP2002308693(A) 申请公布日期 2002.10.23
申请号 JP20010328379 申请日期 2001.10.25
申请人 BEIJING GENERAL RESEARCH INST FOR NONFERROUS METAL 发明人 TU HAILING;WANG YONGHONG;QIAN JIAYU;SONG PING;ZHANG FENGYI
分类号 C30B15/00;(IPC1-7):C30B15/00 主分类号 C30B15/00
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