发明名称 |
SUBSTRATE FOR PHOTOSENSITIVE DRUM AND PHOTOSENSITIVE DRUM USING THIS SUBSTRATE FOR PHOTOSENSITIVE DRUM |
摘要 |
PROBLEM TO BE SOLVED: To obtain a substrate for a photosensitive drum having high quality without the occurrence of molding defects and a photosensitive drum. SOLUTION: The substrate for the cylindrical photosensitive drum which constitutes the substrate for the photosensitive drum used for an electrophotographic process is formed of a conductive resin composition prepared by mixing and dispersing a conducting agent and fillers into a resin base material, in which the apparent viscosity at an apparent shearing rate 10<4> s<-1> of the conductive resin composition is >=1×10<2> to <=3×10<3> poises and the photosensitive drum using this substrate for the photosensitive drum.
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申请公布号 |
JP2002311615(A) |
申请公布日期 |
2002.10.23 |
申请号 |
JP20010113768 |
申请日期 |
2001.04.12 |
申请人 |
BRIDGESTONE CORP |
发明人 |
SUZUKI TAKAHIRO;IIZUKA MUNENORI;MACHIDA KUNIO |
分类号 |
G03G5/10;(IPC1-7):G03G5/10 |
主分类号 |
G03G5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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