发明名称 |
PLASMA TREATMENT EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide plasma treatment equipment with which a high-quality treatment can be carried out at a high speed. SOLUTION: This plasma treatment equipment has a cathode 2, a high-frequency power source 5 connected thereto, a magnetron magnetic field generating means (magnet 20) near the cathode 2 and means (coil 21) of decreasing a cathode sheath voltage VS. |
申请公布号 |
JP2002309374(A) |
申请公布日期 |
2002.10.23 |
申请号 |
JP20010116087 |
申请日期 |
2001.04.13 |
申请人 |
TDK CORP;TAKAMURA SHUICHI |
发明人 |
MOROOKA HISAO;TAKAMURA SHUICHI;UESUGI YOSHIHIKO;ONO TETSUYASU |
分类号 |
H05H1/46;B01J19/08;C23C16/509;H01L21/205;H01L21/302;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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