METHOD FOR PREPARING LIQUID PHOTORESIST PRODUCT HAVING REDUCED NUMBER OF FINE PARTICLES

摘要

PROBLEM TO BE SOLVED: To provide a method for preparing a liquid photoresist product having the reduced number of fine particles without increasing cost. SOLUTION: In the method for preparing the liquid photoresist product by filtering a raw liquid photoresist with one or more filters selected from fluororesin and polyolefin filters, the one or more filters used once or more for filtering the raw liquid photoresist are washed with N-methylpyrrolidone and/or another organic solvent in a direction opposite to the filtration direction and the raw liquid photoresist is filtered with the back-washed filters.