BAKE UNIT OF PHOTO-LITHOGRAPHY APPARATUS AND METHOD FOR SENSING WAFER USING THE SAME

摘要

PURPOSE: A bake unit of a photo-lithography apparatus and a method for sensing a wafer using the same are provided to prevent a damage of a wafer by sensing correctly a loading state or an unloading state of the wafer into a bake unit. CONSTITUTION: A transfer unit(100) is formed with a support body(110), a rotary shaft(150), and a transfer arm(130). The support body(110) is used for supporting a bottom of the transfer unit(100). The rotary shaft(150) is connected with the support body(110). The transfer arm(130) is connected with the rotary shaft(150). The rotary shaft(150) is used for rotating the transfer arm(130). The transfer arm(130) is used for loading or unloading a wafer into each process unit. A fin(135) is formed in the transfer arm(130) in order to move a wafer(50) to necessary parts of each process. The first sensor(170) is installed at one side of the support body(110) in order to detect a loading state or an unloading state of the wafer(50). A bake unit(200) is formed with a process chamber(210) and a plate oven(220). A projected side(225) is formed on an upper face of the plate oven(220). An elevation pin(260) is installed on the projected side(225). The second sensor(240) is installed at one side of the plate oven(220) in order to sense a loading state or an unloading state of the wafer(50).