| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method for highly accurately and easily performing the optimization of transfer pattern formation. SOLUTION: In the pattern forming method for forming a transfer pattern for a design pattern by performing lithographic processing, the line width measuring position of the design pattern is extracted on the basis of a previously set condition and a length measuring position recognition pattern is added to the extracted position (ST101). In each importance for maintaining the shape of the design pattern, each pattern part constituting the design pattern is sorted (ST102). Simulation for forming the transfer pattern is performed on the basis of the design pattern (DT103). The line width of the transfer pattern on each pattern position of length measuring position recognition is measured (ST104). The simulation result of each part of the transfer pattern obtained by simulation is evaluated in each importance corresponding to each pattern constituting the design pattern (ST105 to ST111). |
