发明名称 METHOD AND APPARATUS FOR TREATING CIRCUIT MEMBER
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for treating circuit members generating no toxic gas including dioxins. SOLUTION: This method for treating circuit members comprises reaction of multiplayer substrates 9 having a polymeric material with supercritical water made by bridging water 3 to 450 deg.C and a pressure of 30 MPa. Since this method also includes the polymer decomposition step of decomposing the polymeric material by the supercritical water to generate H2 or CH4 , no toxic gas such as dioxins generates owning to decompositing the polymeric material.</p>
申请公布号 JP2002309035(A) 申请公布日期 2002.10.23
申请号 JP20010114810 申请日期 2001.04.13
申请人 ADVANTEST CORP 发明人 OTANI YOKO;WATANABE MASAO
分类号 C08J11/14;B01J3/00;C07B37/06;C07B61/00;C07C1/32;C07C9/04;(IPC1-7):C08J11/14 主分类号 C08J11/14
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