HYDROPHILIZATION TREATMENT OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a hydrophilization treating method of a substrate capable of maintaining high hydrophilicity and water-retaining property for a long time. SOLUTION: A film of SiO2 is formed on the substrate under a reduced pressure of not more than 100 Pa and the obtained SiO2 film is immediately treated with water. The SiO2 film includes a composite SiO2 film formed on an undercoat composed of a TiO2 film, a Al2 O3 film, a Nb2 O5 film, a laminated film obtained by laminating, a TiO2 film on a Al2 O3 film, laminated film obtained by laminating a TiO2 film on a Nb2 O5 or a low radiation film formed by a CVD method.