发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE FILM USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition suitable for use as a soldering resist for electroless gold plating excellent in resistance to the heat of soldering, electric insulating property, electric corrosion resistance, flame resistance and resolution and to provide a photosensitive film having a layer of the photosensitive resin composition capable of ensuring simultaneous adhesion of both faces to substrates by a laminator without carrying out a drying step and a base film. SOLUTION: The photosensitive resin composition is composed of a resin composition obtained by reacting hydroxyl groups in a phosphorus-containing phenoxy resin with a saturated or unsaturated polybasic acid anhydride, a photopolymerizable unsaturated compound containing at least one terminal ethylenically unsaturated group and a photopolymerization initiator. The photosensitive film consists of a layer of the photosensitive resin composition and a support film supporting the layer and a peelable cover film may further be disposed on the photosensitive resin composition layer of the photosensitive film.
申请公布号 JP2002311580(A) 申请公布日期 2002.10.23
申请号 JP20010111660 申请日期 2001.04.10
申请人 HITACHI CHEM CO LTD 发明人 MORITA MASAKI;HATAKEYAMA SHUICHI;TORIKAI KEIGO
分类号 G03F7/032;C08F2/44;C08F2/50;C08F283/06;C08F290/00;G03F7/004;G03F7/027 主分类号 G03F7/032
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