| 摘要 |
PROBLEM TO BE SOLVED: To provide a direct patterning negative-working planographic imaging element which ensures high sensitivity, a high imaging speed, a long storage life and a long service life on a printing machine and does not require processing. SOLUTION: The thermally sensitive composition contains (a) a thermally sensitive compound containing a heat-activatable aromatic cyclic sulfonium zwitterion group represented by structural formula I (where Ar is a substituted or unsubstituted aromatic group; X and Y are independently substituted or unsubstituted methylene groups; and (n) is 1 or 2) and (b) a photothermal conversion material. |
