发明名称 ORGANIC SILICATE POLYMER AND LOW DIELECTRIC INSULATION FILM CONTAINING THE SAME
摘要 PURPOSE: Provided are a silicate polymer excellent in crack resistance, mechanical strength, film-forming property, and dielectric property, a method for preparing the same, and an insulation film containing the same. CONSTITUTION: The silicate polymer is a condensate which is obtained by hydrolyzing a) a linear organic silane oligomer represented by formula 1, and b) a silane compound selected from the group consisting of a compound represented by formula 2, a compound represented by formula 3, and mixture thereof. In the formulae, each of R1 is independently hydrogen, alkyl, allyl, aryl, chlorine, acetoxy, hydroxy, or unsubstituted or substituted, linear or branched alkoxy having 1-4 carbon atoms(wherein the substituent is fluorine), R2 is independently hydrogen, aryl, allyl, or unsubstituted or substituted, linear or branched alkyl having 1-4 carbon atoms(wherein the substituent is a fluorine), R3 is independently chlorine, acetoxy, hydroxy, or unsubstituted or substituted, linear or branched alkoxy having 1-4 carbon atoms(wherein the substituent is a fluorine), each of R4 and R6 is independently hydrogen, allyl, or unsubstituted or substituted, linear or branched alkyl having 1-4 carbon atoms(wherein the substituent is a fluorine), each of R5 and R7 is independently chlorine, acetoxy, hydroxy, or linear or branched alkoxy having 1-4 carbon atoms, n is an integer of 2-20, p is an integer of 0-3, M is linear or branched alkylene, or allylene having 1-6 carbon atoms, each of q and r is an integer of 0-2.
申请公布号 KR20020080097(A) 申请公布日期 2002.10.23
申请号 KR20010019275 申请日期 2001.04.11
申请人 LG CORPORATION 发明人 KANG, JEONG WON;KIM, YEONG DEUK;KO, MIN JIN;MUN, MYEONG SEON;NAM, HYE YEONG;SHIN, DONG SEOK
分类号 C08G77/14;(IPC1-7):C08G77/14 主分类号 C08G77/14
代理机构 代理人
主权项
地址