| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem of a performance enhancing technique in microfabrication using electron beams or X-rays and to provide a negative type resist composition for use in electron beams or X-rays satisfying such characteristics as sensitivity, resolution and resist shape when electron beams or X-rays are used and excellent in PBD stability. SOLUTION: The negative type resist composition contains an alkali-soluble resin containing specified repeating units as a component, a crosslinker which causes crosslinking under an acid, a compound which generates the acid when irradiated with electron beams or X-rays and a fluorine- and/or silicon- containing surfactant. |
