| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition for forming a fine line pattern particularly even when the space width of a line-and-space pattern is wide and excellent also in transparency, sensitivity and resolution to radiation. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble resin containing repeating units derived from a compound obtained by substituting a group of formula (1), (2) or (3) (where R<2> , R<4> and R<6> are each H or lower alkyl; X is methylene, -O- or -S-; and (a) is 1-5) for the hydrogen atom of a carboxyl group in (meth)acrylic acid and repeating units derived from 2-methyl-2-adamantyl (meth)acrylate or the like and exhibiting alkali solubility under the action of an acid, (B) a radiation sensitive acid generator and (C) a polycyclic compound having a functional group such as a t-butoxycarbonyl group. |
