发明名称 |
METHOD OF MANUFACTURING SUBSTRATE FOR DISPLAY AND PHOTOMASK USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To form the rugged shapes of a reflecting surface to shapes to make reflection easy. SOLUTION: This method of manufacturing the substrate for display has a process step of forming an insulative resin having photosensitivity on the substrate, a process step of exposing the insulative resin by using a photomask formed with patterns for forming the ruggedness on the surface of the resin, a process step of developing the exposed resin and a process step of forming display electrodes for reflection on the resin formed with the ruggedness. The exposure process step uses the photomask 5 formed with auxiliary patterns 53 for allowing the resin to remain for the purpose of forming slopes at the circumference of the resin for the circumference of the patterns for allowing the resin of the photomask to remain. |
申请公布号 |
JP2002311596(A) |
申请公布日期 |
2002.10.23 |
申请号 |
JP20010117230 |
申请日期 |
2001.04.16 |
申请人 |
SANYO ELECTRIC CO LTD;TOTTORI SANYO ELECTRIC CO LTD |
发明人 |
MORITA SATOSHI;KOBAYASHI OSAMU;TANAKA SHINICHIRO |
分类号 |
G02B5/08;G02F1/13;G02F1/1335;G02F1/1343;G03F1/00;G03F1/70;G03F7/20;G09F9/00;G09F9/30;H01L21/027 |
主分类号 |
G02B5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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