发明名称 RADIATION-SENSITIVE COMPOSITION UNDERGOING CHANGE IN REFRACTIVE INDEX, AND METHOD FOR CHANGING REFRACTIVE INDEX
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition undergoing a change in refractive index, which can realize a change in the refractive index of a material by a simple method, giving a sufficiently great difference in refractive index due to the change, and can give a refractive index pattern and an optical material that are stable independent of the service conditions thereafter. SOLUTION: The radiation-sensitive composition undergoing a change in refractive index contains (A) a decomposable compound, (B) a nondecomposable compound having a refractive index higher than that of the compound (A), (C) a radiation-sensitive decomposer and (D) a stabilizing agent. The irradiation of the composition with radiations through a pattern mask decomposes the components (C) and (A) at the irradiated part to produce a difference in refractive index between the irradiated part and the unirradiated part, thus forming a pattern different in refractive index.
申请公布号 JP2002309110(A) 申请公布日期 2002.10.23
申请号 JP20010372213 申请日期 2001.12.06
申请人 JSR CORP 发明人 NISHIMURA ISAO;BESSHO NOBUO;KUMANO KOJI;SHIMOKAWA TSUTOMU;YAMADA KENJI
分类号 G03F7/004;C08K5/00;C08L67/00;C08L69/00;C08L71/00;C08L73/00;C08L79/00;C08L81/02;C08L83/04;C08L83/14;C08L85/00;C08L101/00;C09K3/00;G02B1/04;G02B3/00;G02B5/18;G03H1/02 主分类号 G03F7/004
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