| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for preparing a photoresist product without increasing cost. SOLUTION: The following steps (a)-(e) are carried out using an apparatus comprising a mixing tank in which the components of a resist are mixed, valves, a filter selected from fluororesin and polyolefin filters, etc.; (a) a step for filtering a raw resist in the mixing tank with the filter, (b) a step for washing the wet filter obtained in the step (a) with N-methylpyrrolidone and/or another solvent in a direction opposite to the filtration direction, (c) a step for filtering a solution of the same resin as the resist resin or a resin different from the resist resin in a solvent with the back-washed filter, (d) a step for mixing a resin solution obtained in the step (c) with a photosensitive agent in the mixing tank and (e) a step for filtering a raw liquid resist obtained in the step (d) with the back-washed filter after the step (c). |
