RAPID THERMAL CVD APPARATUS AND METHOD FOR FABRICATING SUBSTRATE AND THIN FILM BY USING THE SAME

摘要

PURPOSE: A rapid thermal CVD(Chemical Vapor Deposition) apparatus and a method for fabricating a substrate and a thin film by using the same are provided to improve quality of a deposited thin film and to lower a processing temperature by the rapid thermal CVD apparatus. CONSTITUTION: A preheat portion(20) preheats a reaction gas of a reaction furnace by using a radio wave having a pitch of 13.56 MHz. The reaction gas is transmitted to a substrate(1) loaded on a quartz tube(30). A lamp(44) is a halogen lamp for emitting light of a near infrared region. The light of the lamp(44) passes through the quartz tube(30). The substrate(1) is heated by the light of the lamp(44). A pump is installed at an end portion of a reaction furnace. The pump is used for discharging a gas of the reaction furnace to the outside. A lamp control portion(43) controls an operation of the lamp(44) according to a timer(41) and a pyrometer(42).