发明名称 |
Tertiary alcohol compounds having an alicyclic structure |
摘要 |
The present invention provides novel tertiary alcohol compounds which are useful as monomers for the preparation of photoresist materials having high transparency and a great affinity for the substrate and hence suitable for use in photolithography using a light source comprising preferably light having a wavelength of 300 nm or less and more preferably light emitted from an ArF excimer laser.Specifically, the present invention provides tertiary alcohols compounds represented by the following general formula (1):wherein R1 and R2 each independently represent a straigh-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, in which some or all of the hydrogen atoms on the constituent carbon atoms may be replaced by a halogen atom or halogen atoms, or R1 and R2 may be joined together to form an aliphatic hydrocarbon ring; Z represents a straight-chain, branched or cyclic divalent organic group having 2 to 10 carbon atoms; and k is 0 or 1.
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申请公布号 |
US6469220(B2) |
申请公布日期 |
2002.10.22 |
申请号 |
US20010025064 |
申请日期 |
2001.12.19 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HASEGAWA KOJI;KINSHO TAKESHI;WATANABE TAKERU |
分类号 |
C07C33/14;C07C35/21;G03F7/039;(IPC1-7):C07C35/22 |
主分类号 |
C07C33/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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