发明名称 Non-volatile semiconductor memory device and manufacturing method thereof
摘要 A non-volatile semiconductor memory device allowing accurate reading of data, having superior charge detection characteristic and high rewriting durability, and free of undesirable writing of a non-selected memory cell transistor is provided. A memory cell transistor 100b includes a silicon substrate 1 having a main surface, a plurality of strip shaped isolating oxide films 4a and 4b formed on the main surface 1b of silicon substrate 1 to continuously extend approximately along the <100> direction, and strip shaped source and drain regions 5b and 6b formed on the main surface 1b of silicon substrate 1 to continuously extend approximately along the <100> direction.
申请公布号 US6469338(B2) 申请公布日期 2002.10.22
申请号 US19990324808 申请日期 1999.06.03
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 KOBAYASHI KIYOTERU;TSUJI NAOKI
分类号 H01L21/8247;H01L27/115;H01L29/04;H01L29/788;H01L29/792;(IPC1-7):H01L29/94 主分类号 H01L21/8247
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