发明名称 Light-emitting gallium nitride-based compound semiconductor device
摘要 A light-emitting gallium nitride-based compound semiconductor device of a double-heterostructure. The double-heterostructure includes a light-emitting layer formed of a low-resistivity InxGa1-xN (0<x<1) compound semiconductor doped with p-type and/or n-type impurity. A first clad layer is joined to one surface of the light-emitting layer and formed of an n-type gallium nitride-based compound semiconductor having a composition different from the light-emitting layer. A second clad layer is joined to another surface of the light-emitting layer and formed of a low-resistivity, p-type gallium nitride-based compound semiconductor having a composition different from the light-emitting layer.
申请公布号 US6469323(B1) 申请公布日期 2002.10.22
申请号 US20000516193 申请日期 2000.03.01
申请人 NICHIA CHEMICAL INDUSTRIES, LTD. 发明人 NAKAMURA SHUJI;MUKAI TAKASHI;IWASA NARUHITO
分类号 H01L21/20;H01L33/00;H01L33/02;H01L33/32;H01S5/323;(IPC1-7):H01L33/00 主分类号 H01L21/20
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