发明名称 |
Light-emitting gallium nitride-based compound semiconductor device |
摘要 |
A light-emitting gallium nitride-based compound semiconductor device of a double-heterostructure. The double-heterostructure includes a light-emitting layer formed of a low-resistivity InxGa1-xN (0<x<1) compound semiconductor doped with p-type and/or n-type impurity. A first clad layer is joined to one surface of the light-emitting layer and formed of an n-type gallium nitride-based compound semiconductor having a composition different from the light-emitting layer. A second clad layer is joined to another surface of the light-emitting layer and formed of a low-resistivity, p-type gallium nitride-based compound semiconductor having a composition different from the light-emitting layer.
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申请公布号 |
US6469323(B1) |
申请公布日期 |
2002.10.22 |
申请号 |
US20000516193 |
申请日期 |
2000.03.01 |
申请人 |
NICHIA CHEMICAL INDUSTRIES, LTD. |
发明人 |
NAKAMURA SHUJI;MUKAI TAKASHI;IWASA NARUHITO |
分类号 |
H01L21/20;H01L33/00;H01L33/02;H01L33/32;H01S5/323;(IPC1-7):H01L33/00 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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