| 摘要 |
PURPOSE: To provide an ITO(indium-tin-oxide) target which reduces the amount of particles caused by nodules generated on an erosion part in accordance with the increase of the cumulative use time of the target and the amount of particles caused by yellow powders deposited on a nonerosion part. CONSTITUTION: In the ITO sputtering target substantially consisting of indium, tin and oxygen, the non erosion part is made thinner than the erosion part to project the erosion part. Further, a shape obtained by connecting the plane including the erosion part and the plane including the nonerosion part by an obtuse-angled slant is formed. The surface roughness (Ra) of the erosion part is controlled to <=0.1 μm, and the Ra of the nonerosion part and slant part obtained by connecting the erosion part and the nonerosion part is controlled to >=1.0 μm.
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