发明名称 ALIGNER AND SUBSTRATE PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an aligner which contributes to the improvement of device productivity. SOLUTION: A first body units ST1 for supporting a substrate stage WST1 is supported at four points by vibration isolating units (16A, 16B, and so on), and a second body unit ST2 for holding a projection optical system PL is supported at three points on the first body unit by second vibration isolating units (24A, 24B, and so on). On this account, the first body unit and the substrate stage are supported with stability and high rigidity. With this constitution, unlike the cases, where for example, the first body unit is supported at three points, the stage portion can be maintained from the rear side (-X side) of the aligner. Since vibration isolating units are provided in series in two stages, background vibration from the floor face is suppressed effectively. Therefore, the improvement of the yield of devices, owing to highly accurate exposure, the enhancement of the availability of the system owing to reduction of maintenance time, and by extension, the enhancement of productivity for devices as end products are feasible.
申请公布号 JP2002305140(A) 申请公布日期 2002.10.18
申请号 JP20010108334 申请日期 2001.04.06
申请人 NIKON CORP 发明人 NISHI TAKECHIKA
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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