发明名称 PHOTORESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To enhance the strippability of a composition capable of photoimaging. SOLUTION: The photoresist composition contains a polymeric binder, a photoactive component, a photoresist strip enhancer and optionally a cross- linking agent, wherein the photoresist strip enhancer is non-polymerizable with the polymeric binder, optional cross-linking agent or both and has formula (1) wherein each X is independently chlorine, bromide, fluorine or iodine; Z= cyano, aryl, substituted aryl, C(Y)-R<1> , C&equiv;C-R<2> and C(R<3> )=CR<4> R<5> ; Y=oxygen or sulfur; and R=Z, hydrogen, (C1 -C4 )alkyl, (C1 -C4 )alkoxy, substituted (C1 -C4 ) alkyl, substituted (C1 -C4 )alkoxy.
申请公布号 JP2002303970(A) 申请公布日期 2002.10.18
申请号 JP20010362912 申请日期 2001.11.28
申请人 SHIPLEY CO LLC 发明人 KOES THOMAS A;TODD JOHNSON
分类号 G03F7/004;G03F7/027;G03F7/033;G03F7/42;H01L21/027 主分类号 G03F7/004
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