RAPID THERMAL PROCESSING APPARATUS FOR FABRICATING SEMICONDUCTOR

摘要

PURPOSE: A rapid thermal processing apparatus for fabricating a semiconductor is provided to more rapidly exhaust the gas induced to the inside of a tube, by installing a pump and the third gas exhaust line in addition to the first and second gas exhaust lines. CONSTITUTION: The first and second gas exhaust lines(106,107) exhaust the induced gas to the exterior, connected to the tube(102). The pump(108) and the third gas exhaust line(109) exhaust more smoothly the gas, connected to the first gas exhaust line. A door flange(104) fixes a chamber(100) and a wafer tray(103) to/from which a wafer is loaded/unloaded.